ZnO Films from Thermal Oxidation of Zn Films: Effect of the Thickness of the Precursor Films on the Structural, Morphological, and Optical Properties of the Products

Abstract

Zinc oxide (ZnO) films with different structural, morphological, and optical properties were obtained by (fixed) thermal oxidation of deposited metallic zinc (Zn) films. The main characteristics of the oxidized films are discussed in terms of the Zn film thickness. On-axis preferential crystallographic oriented growth of ZnO can be tuned based on the control of the thickness of the deposited Zn: c-axis (a-axis) for the thinnest (thicker) Zn film. The thicker ZnO film is rather a-textured, whereas the grains hosted by the ZnO films corresponding to the Zn films of intermediate thicknesses are more randomly oriented. For Zn films of ever-increasing thickness, a tendency towards the crystallization of larger ZnO nanocrystals holds, combined with a continuous increment on the surface roughness. In contrast, the fundamental bandgap of the resultant oxide-based films decreases with thickness. The roughness of the ZnO films is not directly measured. It is qualitatively described by the analysis of Zn-film micrographs obtained by Scanning Electron Microscopy and by the demonstration of strong optical scattering interactions present in the thicker ZnO films by their random lasing activity.